Magnetron sputtering system
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Two 2-inch guns.
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2 RF generators maximum power up to 300W.
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Shutters for precise control of multilayer deposition.
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Equip with a butterfly valve for automatic pressure control.
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Equip with O2, Ar Mass flow controller.
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Max temperature up to 800°C
Magnetron sputtering system
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Three 3-inch guns.
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3 RF generators maximum power up to 1000W.
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DC bias on the carrier (V: 0~1k).
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Shutters for precise control of multilayer deposition.
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Equip with a butterfly valve for automatic pressure control.
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Equip with O2, N2, Ar Mass flow controller.
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Max temperature up to 600°C
● Spin coater, digital magnetic hotplates and fume cupboard for the sol-gel growth of thin films.
● Oxygen trace analyser
(measurement range:10-20 ppm to 100%).
● One MoSi2 high-temperature programmable box furnace (up to 1600 °C).
● Three sets of airtight tube MoSi2 high-temperature furnaces (up to 1600 °C) with atmosphere control systems for flowing O2, Ar, Ar+H2, etc.
●Two NiCr filament high-temperature programmable box furnace (up to 1200 °C).
●SiC filament high-temperature programmable box furnace (up to 1350 °C).
● Two sets of quartz tube (up to 1000 °C) with atmosphere control systems for flowing O2, Ar, Ar+H2, etc.
● Radiant Precision Ferroelectric Test System
(maximum voltage 100V, frequency 1.67 kHz).
● Microscope and micro-positioners/probes
(smallest tip diameter 5 microns).
● Magnetoelectric response measurement system.
● Wayne Kerr 6510B Impedance analyzer
(100Hz-10MHz).
● Aglient 8714ET Network analyzer
(300KHz-3GHz).
● High voltage polarization system
(DC voltage up to MAX 40 KV / MAX 0.375 mA).
●The PiezoMeter is appropriate to almost any sample geometry. An accurate reading is achieved in seconds.
● Four-point probe tester.
● RT measurement chamber
(High-vacuum <1 pa, high-temperature up to 900 °C).
●Simultaneous determination of Seebeck coefficient and electrical conductivity.
● Oxygen Plasma Cleaner
6" diameter ; Max power 100W